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Journal of Microlithography, Microfabrication and Microsystems

Volumn 3, Issue 4, 2004, Pages 523-528

Liquid immersion lithography using water as an immersion liquid: Role of orientation contributions to light scattering at 193 nm

(2) Letz, M a Knapp, K b

a SCHOTT AG (Germany)

b Schott Lithotec AG (Germany)

Author keywords

Light scattering; Liquid immersion; Molecular fluid; Optical microlithography; Water PACS numbers

Indexed keywords

ANISOTROPY; LIGHT POLARIZATION; LIGHT SCATTERING; MOLECULAR DYNAMICS; MOLECULAR ORIENTATION; NEUTRON SCATTERING; OPTICAL SYSTEMS; RAYLEIGH SCATTERING; WATER;

LIQUID IMMERSION; MOLECULAR FLUIDS; OPTICAL MICROLITHOGRAPHY; WATER PACS NUMBERS;

LITHOGRAPHY;

EID: 13244299165 PISSN: 15371646 EISSN: None Source Type: Journal
DOI: 10.1117/1.1794179 Document Type: Article

Times cited : (1)

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