Technique for separately viewing multiple levels

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3405-3408

  Jiang, L ^a   Feldman, M ^a  

^a LOUISIANA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GRID-BASED SYSTEM; IMAGE PLACEMENT; INTERFERENCE FILTERS; PRECISION GRATING;

COMPUTER SOFTWARE; COORDINATE MEASURING MACHINES; IMAGE ANALYSIS; INTEGRATED CIRCUIT TESTING; LITHOGRAPHY; MASKS; MEASUREMENT ERRORS; MEASUREMENT THEORY; OPTICAL FILTERS; POLYMETHYL METHACRYLATES; TOLUENE; VIDEO CAMERAS;

OPTICAL MICROSCOPY;

EID: 13244294179     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1802852     Document Type: Conference Paper

References (9)

1. Update, International Technology Roadmap for Semiconductors (Semiconductor Industry Association, San Jose, CA, 2002); http://public.itrs.net.
2. Coumarin number 314 dye, Sigma-Aldrich Corporation, 3050 Spruce St., Saint Louis, MO 63103-2530.
3. Interference filter catalog number R46-159, Edmund Industrial Optics, 101 East Gloucester Pike, Barrington, NJ 08007-1380.
4. Microscope model BX60, with objective model UPlanFl 1.30 NA, Olympus America Inc., 2 Corporate Center Drive, Melville, NY 11747.
5. INTELLICAM v2.05 software, Matrox Electronic Systems Ltd, boul. St-Régis Dorval, Québec, Canada H9P 2T4.
6. Interference filter catalog number R46-156, Edmund Industrial Optics, 101 East Gloucester Pike, Barrington, NJ 08007-1380.
7. J. S. Courtney-Pratt and R. L. Gregory, Appl. Opt. 12, 2509 (1973).
8. M. Schattenburg et al., J. Vac. Sci. Technol. B 17, 2638 (1999).
9. P. T. Konkola et al., J. Vac. Sci. Technol. B 21, 3097 (2003).