Separation of gallium and arsenic in wafer grinding extraction solution using a supported liquid membrane that contains PC88A as a carrier

Journal of Environmental Science and Health - Part A Toxic/Hazardous Substances and Environmental Engineering

Volumn 40, Issue 2, 2005, Pages 477-491

  Tsai, Chin Ying ^a   Chen, Yi Fu ^a   Chen, Wen Ching ^a   Yang, Fong Ru ^a   Chen, Jyh Herng ^b   Lin, Jing Chie ^c  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^b NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY   (Taiwan)

^c NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

Arsenic; Gallium; PC88A; Separation; Supported liquid membrane

Indexed keywords

ARSENIC; EXTRACTION; GRINDING (MACHINING); HYDROCHLORIC ACID; HYDROPHOBICITY; LIQUID MEMBRANES; POLYTETRAFLUOROETHYLENES; SEPARATION;

HYDROPHOBIC MEMBRANES; SUPPORTED LIQUID MEMBRANES (SLM); WAFER GRINDING EXTRACTION;

GALLIUM;

2 ETHYLHEXYL PHOSPHONIC ACID MONO 2 ETHYLHEXYLESTER; ARSENIC; ESTER DERIVATIVE; GALLIUM; POLITEF; UNCLASSIFIED DRUG;

ARTICLE; CHELATION; LIQUID MEMBRANE; PH; SEPARATION TECHNIQUE;

ARSENIC; GALLIUM; HAZARDOUS SUBSTANCES; INDUSTRY; MEMBRANES, ARTIFICIAL; POLYTETRAFLUOROETHYLENE; WATER POLLUTANTS; WATER PURIFICATION;

EID: 13144264944     PISSN: 10934529     EISSN: None     Source Type: Journal    
DOI: 10.1081/ESE-200045652     Document Type: Article

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