X-ray reflectivity and total-reflection fluorescence analysis of amorphous SiO2/Ta2O5 thin films

Chinese Journal of Physics

Volumn 42, Issue 5, 2004, Pages 607-618

  Chang, Wei Der ^a   Hung, Hsueh Hsing ^a   Dann, Tang Eh ^a   Huang, Tung Wuu ^b   Wu, Shiou Yun ^b  

^a NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

^b CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 12944294372     PISSN: 05779073     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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