Trace element analysis on Si wafer surfaces by TXRF at the ID32 ESRF undulator beamline

Journal of Synchrotron Radiation

Volumn 5, Issue 3, 1998, Pages 1064-1066

  Ortega, Luc ^a,b   Comin, Fabio ^a   Formoso, Vincenzo ^a   Stierle, Andreas ^a  

^a EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Grazing incidence; Semiconductor applications; Surface contamination; Trace element analysis; X ray fluorescence and reflectivity

Indexed keywords

EID: 0032393691     PISSN: 09090495     EISSN: None     Source Type: Journal    
DOI: 10.1107/S0909049597016737     Document Type: Article

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