Electron spin resonance characterization of defects in high-k HfO 2 thin film prepared by pulsed laser deposition

Journal of the Korean Physical Society

Volumn 46, Issue 1, 2005, Pages 258-261

  Kanashima, Takeshi ^a   Ikeda, Koji ^a   Tada, Taizo ^a   Sohgawa, Masayuki ^a   Okuyama, Masanori ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Defect; Electron paramagnetic resonance (EPR); Electron spin resonance (ESR); HfO2; Interface state; Interfacial layer; Pulsed laser deposition (PLD); XPS

Indexed keywords

EID: 12944292936     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (9)

1. D. C. Gilmer, R. Hegde, R. Cotton, et al., Microelec. Eng. 69, 138 (2003).
2. C. Ohshima, J. Taguchi, I. Kashiwagi, H. Yamamoto, S. Ohmi and H. Iwai, Appl. Surf. Sci. 216, 302 (2003).
3. T. Kanashima, M. Sohgawa, H. Kanda, K. Ikeda and M. Okuyama, J. Korean Phys. Soc. 42, S1357 (2003).
4. S. Kitai, O. Maida, T. Kanashima and M. Okuyama, Jpn. J. Appl. Phys. 42, 247 (2003).
5. K. Awazu, K. Watanabe and H. Kawazoe, Jpn. J. Appl. Phys. 32, 2746 (1993).
6. H. Nishikawa, E. Watanabe and D. Ito, Phys. Rev. Lett. 72, 2101 (1994).
7. R. Tohmon, H. Mizuno, Y. Ohki, K. Sasagane, K. Nagasawa and Y. Hama, Phys. Rev. B 39, 1337 (1989).
8. T. Kanashima, M. Okuyama and Y. Hamakawa, Jpn. J. Appl. Phys. 32, 3113 (1993).
9. E. Holzenkãmpfer, F.-W. Richter, J. Stuke and U. Voget-Grote, J. Non-Crystalline Solids 32, 327 (1979).