Preparation of IrO2 thin films by MOCVD by using Ir(EtCp)(CHD)

Journal of the Korean Physical Society

Volumn 46, Issue 1, 2005, Pages 176-179

  Fujisawa, H ^a   Shimizu, M ^a   Niu, H ^a   Watari, S ^a   Oshima, N ^b  

^a UNIVERSITY OF HYOGO   (Japan)

^b TOSOH CORPORATION   (Japan)

Author keywords

Ir; IrO2; MOCVD; PZT

Indexed keywords

EID: 12944289542     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (14)

1. T. Nakamura, Y. Nakao, A. Kamisawa and H. Takasu, Appl. Phys. Lett. 65, 1522 (1994); Jpn. J. Appl. Phys. 33, 5207 (1994).
2. T. Nakamura, Y. Nakao, A. Kamisawa and H. Takasu, Appl. Phys. Lett. 65, 1522 (1994); Jpn. J. Appl. Phys. 33, 5207 (1994).
3. J. B. Hoke, E. W. Stern and H. M. Murry, J. Mater. Chem. 1, 551 (1991).
4. S. K. Dey, J. Goswami, C-G, Wang and P. Majhi, Jpn. J. Appl. Phys. 38, L1052 (1999).
5. R. Vergas, T. Goto, W. Zhang and T. Hirai, Appl. Phys. Lett. 65, 1094 (1994).
6. Y.-M. Sun, J. P. Endle, K. Smith, J. G. Ekerdt, R. L. Hance, P. Alluri and J. M. White, Mater. Res. Soc. Symp. Proc. 541, 101 (1999).
7. C. Xu, F. Dimeo Jr., T. H. Baum and M. Russel, Mater. Res. Soc. Symp. Proc. 541, 129 (1999).
8. H. Fujisawa, K. Kita, M. Shimizu and H. Niu, Jpn. J. Appl. Phys. 40, 5551 (2001).
9. M. Shimizu, K. Kita, H. Fujisawa and H. Niu, Mater. Res. Soc. Symp. Proc. 655, CC1.10.1 (2001).
10. N. Oshima, K. Kawano, M. Takamori, T. Yamakawa, S. Watari, H. Fujisawa, M. Shimizu and H. Niu, Abs. of 204th ECS Meeting, 2003-2, 554 (2003).
11. K. Kawano, M. Takamori, K. Tada, T. Yamakawa, S. Watari, H. Fujisawa, M. Shimizu, H. Niu and N. Oshima, Mater. Res. Soc. Symp. Proc. 762, C3.30.1 (2004).
12. H. Fujisawa, S. Watari, N. Iwamoto, M. Shimizu, H. Niu and N. Oshima, submitted to Integrated Ferroelectrics (2004).
13. W. D. Ryden, A. W. Lawson and C. C. Sartain, Phys. Rev. B 1, 1494 (1970).
14. S. Nakashima, H. Fujisawa, M. Shimizu and H. Niu (unpublished).