Full characterization of a high-gain saturated x-ray laser at 13.9 nm

Physical Review A - Atomic, Molecular, and Optical Physics

Volumn 61, Issue 4, 2000, Pages 438101-438109

  Sebban, S ^a,g   Daido, H ^a   Sakaya, N ^a   Kato, Y ^a,h   Murai, K ^b   Tang, H ^a,c   Gu, Y ^c   Huang, G ^c   Wang, S ^c   Klisnick, A ^d   Zeitoun, Ph ^d   Koike, F ^e   Takenaka, H ^f  

^a OSAKA UNIVERSITY   (Japan)

^b OSAKA NATIONAL RESEARCH INSTITUTE   (Japan)

^c National Laboratory for High Power Lasers and Physics   (China)

^d UNIVERSITÉ PARIS SACLAY   (France)

^e KITASATO UNIVERSITY SCHOOL OF MEDICINE   (Japan)

^f NTT CORPORATION   (Japan)

^g LABORATOIRE D OPTIQUE APPLIQUÉE   (France)

^h JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 12944281814     PISSN: 10502947     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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