Novel route for the production of X-ray masks from a range of organometallic films

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 279-282

  Davidson, M R ^a   Berry, G J ^a   Cairns, J A ^a   Fitzgerald, A G ^a   Lawrenson, B ^a   Thomson, J ^a   Turcu, I C E ^b   Shaikh, W ^b   Spencer, N ^b   Allott, R M ^b   Takeyasu, N ^b  

^a UNIVERSITY OF DUNDEE   (United Kingdom)

^b RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; FABRICATION; FILMS; IRRADIATION; ORGANOMETALLICS; X RAY LITHOGRAPHY;

NOVEL ROUTE;

MASKS;

EID: 12844279526     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00064-1     Document Type: Article

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