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Volumn 67, Issue 9, 1996, Pages 3245-3247

1 W plasma x-ray source for lithography at 1 nm wavelength

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0005478101     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1147404     Document Type: Article
Times cited : (8)

References (13)
  • 4
    • 85033836144 scopus 로고    scopus 로고
    • Lambda 4000, 200 W excimer lasers, Lambda Physik GmbH, Hans-Boeckler Str 12, D-3400 Goettingen, Germany
    • Lambda 4000, 200 W excimer lasers, Lambda Physik GmbH, Hans-Boeckler Str 12, D-3400 Goettingen, Germany.
  • 5
    • 85033851966 scopus 로고    scopus 로고
    • VEL, 1 kW excimer laser, Sopra, 26, Rue Pierre Joigneaux, F92270 Bois-Colombes, France
    • VEL, 1 kW excimer laser, Sopra, 26, Rue Pierre Joigneaux, F92270 Bois-Colombes, France.
  • 13
    • 85033845348 scopus 로고    scopus 로고
    • International Patent Application No. PCT/GB94/00928 (1994)
    • I. C. E. Turcu and I. N. Ross, International Patent Application No. PCT/GB94/00928 (1994).
    • Turcu, I.C.E.1    Ross, I.N.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.