Water immersion of model photoresists: Interfacial influences on water concentration and surface morphology

Journal of Microlithography, Microfabrication and Microsystems

Volumn 4, Issue 1, 2005, Pages 1-6

  Vogt, Bryan D ^a   Soles, Christopher L ^a   Wang, Chla Ying ^a   Prabhu, Vivek M ^a   Mcguiggan, Patricia M ^a   Douglas, Jack F ^a   Lin, Eric K ^a   Wu, Wen Li ^a   Satija, Sushil K ^a   Goldfarb, Darío L ^b   Angelopoulos, Marie ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

Immersion lithography; Microlithography; Reflectivity; Water

Indexed keywords

DEPTH PROFILE; IMMERSION LIQUID; IMMERSION LITHOGRAPHY; PIN-HOLE DEFECTS;

APPROXIMATION THEORY; INTERFACES (MATERIALS); MORPHOLOGY; NEUTRON REFLECTION; SILICON WAFERS; SWELLING; THIN FILMS; WATER;

PHOTORESISTS;

EID: 12844270540     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1861852     Document Type: Article

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