Evaluation of OPC efficacy

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2726, Issue , 1996, Pages 680-688

  Schellenberg, F M ^a   Zhang, Hua ^a   Morrow, Jim ^a  

^a SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER AIDED DESIGN; IMAGE PROCESSING; INTEGRATED CIRCUIT LAYOUT; MASKS; METRIC SYSTEM; OPTICAL RESOLVING POWER; SCANNING ELECTRON MICROSCOPY;

OVERALL PROCESS CORRECTION (OPC);

LITHOGRAPHY;

EID: 0030314757     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240986     Document Type: Conference Paper

References (4)

1. Real and imaginary phase-shifting masks
2. Sub-quarter micron optical lithography with a practical super resolution technique
3. Feature biasing versus feature-assisted lithography - A comparison of proximity correction methods for 0.5*(λ/NA) lithography
4. Fast proximity correction with zone sampling