Effect of lens distortion in optical step-and-scan lithography

Applied Optics

Volumn 35, Issue 4, 1996, Pages 690-700

  Braat, Joseph ^a   Rennspies, Peter ^b  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRAL EQUATIONS; MATHEMATICAL MODELS; MIRRORS; OPTICAL INSTRUMENT LENSES; OPTICAL TRANSFER FUNCTION; PHASE SHIFT; POLYNOMIALS; PROJECTION SYSTEMS; SCANNING;

IMAGE SHIFT; LENS DISTORTION; MODULATION DEPTH; OPTICAL STEP AND SCAN LITHOGRAPHY; ORTHOGONAL ZERNIKE POLYNOMIALS; RETICLE;

PHOTOLITHOGRAPHY;

EID: 0030080470     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.35.000690     Document Type: Article

References (14)

1. D. A. Markle, “The future and potential of optical scanning systems,” Solid State Technol. 27, 159-166 (1984).
2. J. Bischoff, W. Henke, T. v. d. Werf, and P. Dirksen, “Simulations on step & scan optical lithography,” in Optical/Laser Microlithography VII, T. A. Brunner, ed., Proc. Soc. Photo-Opt. Instrum. Eng. 2197, 953-964 (1994).
3. M. D. van den Brink, C. G. de Mol, and R. A. George, “Matching performance for multiple wafer steppers using an advanced metrology procedure,” in Integrated Circuit Metrology, Inspection, and Process Control II, K. M. Monahan, ed., Proc. Soc. Photo-Opt. Instrum. Eng. 921, 180-197 (1988).
4. W. W. Flack, “Overlay distortions in wafer-scale integration lithography,” in Optical/Laser Microlithography VI, J. D. Cuthbert, ed., Proc. Soc. Photo-Opt. Instrum. Eng. 1927, 543-554 (1993).
5. A. Lohmann, “Aktive KontrastUbertragungstheorie,” Opt. Acta 6, 319-338 (1959).
6. D. P. Paris, “Influence of image motion on the resolution of a photographic system,” Photogr. Sci. Eng. 6, 55-59 (1962).
7. A. W. Lohmann and D. P. Paris, “Influence of longitudinal vibrations on image quality,”Appl. Opt. 4, 393-397 (1965).
8. B. J. Lin, “Where is the lost resolution?,” in Optical Microlithography V, H. L. Stover, ed., Proc. Soc. Photo-Opt. Instrum. Eng. 633, 44-50 (1986).
9. B. J. Lin, “Vibration tolerance in optical imaging,” in Optical/Laser Microlithography II, B. J. Lin, ed., Proc. Soc. Photo-Opt. Instrum. Eng. 1088, 106-114 (1989).
10. F. Lei and H. J. Tiziani, “Einflusse der transversalen und longitudinalen Objecktbewegung auf die Bildqualitat im Nahbereich,” Optik 86, 173-183 (1991).
11. J. Braat, “Quality of microlithographic projection lenses,” in Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection, H. L. Stover and S. Wittekoek, eds., Proc. Soc. Photo-Opt. Instrum. Eng. 811, 22-30 (1987).
12. J. Braat, “Grating moire effects with partially coherent illumination and detection,” in Optical Microlithography and Metrology for Microcircuit Fabrication, M. J. Lacombat and S. Wittekoek, eds., Proc. Soc. Photo-Opt. Instrum. Eng. 1138, 54-63 (1989).
13. J. D. Armitage and J. P. Kirk, “Analysis of overlay distortion patterns,” in Integrated Circuit Metrology, Inspection, and Process Control II, K. M. Monahan, ed., Proc. Soc. Photo-Opt. Instrum. Eng. 921, 207-222 (1988).
14. I. W. Kwee and J. J. M. Braat, “Double Zernike expansion of the optical aberration function,” Pure Appl. Opt. 2, 21-32 (1993).