Utilisation of a sputtering device for targetry and diffusion studies

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 226, Issue 3, 2004, Pages 441-446

  Laitinen, P ^a,b   Nevala, M ^a   Pirojenko, A ^a   Ranttila, K ^a   Seppala R ^a   Riihimaki I ^a   Raisanen J ^b   Virtanen, A ^a  

^a UNIVERSITY OF JYVÄSKYLÄ   (Finland)

^b UNIVERSITY OF HELSINKI   (Finland)

Author keywords

Serial sectioning; Sputtering; Target fabrication

Indexed keywords

CHARGED PARTICLES; DIFFUSION; ION BEAMS; LENSES; NUCLEAR PHYSICS; PLASMAS; SOLID STATE PHYSICS;

EINZEL LENS; ION BEAM SPUTTERING; SERIAL SECTIONING; SOLID-STATE DIFFUSION; TARGET FABRICATION;

SPUTTERING;

EID: 12444296523     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2004.06.027     Document Type: Article

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