Development of a chemically assisted micro-beam etching system for three-dimensional microanalysis

Applied Surface Science

Volumn 203-204, Issue , 2003, Pages 205-208

  Tanaka, Y ^a   Karashima, M ^a   Takanashi, K ^a   Sakamoto, T ^b   Owari, M ^a,b   Nihei, Y ^c  

^a INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

^c TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

3D microanalysis; CAIBE; ESD; Reactive gas; Shave off; SIMS

Indexed keywords

ELECTRON BEAMS; HALOGEN COMPOUNDS; ION BEAMS; REACTIVE ION ETCHING; SECONDARY ION MASS SPECTROMETRY;

CHEMICALLY ASSITED ION BEAM ETCHING (CAIBE);

MICROANALYSIS;

EID: 12244311839     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)00626-8     Document Type: Conference Paper

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