Small aperture fabrication for single quantum dot spectroscopy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3891-3893

  Park, D ^a   Marrian, C R K ^a   Gammon, D ^a   Bass, R ^a   Isaacson, P ^a   Snow, E ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11744257104     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590429     Document Type: Article

References (8)

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2. C. Eckes, G. Pawlowski, K. Przybilla, W. Meier, M. Madore, and R. Dammel, Proc. SPIE 1466 (1991).
3. AZPN114 resist from Hoechst-Celanese, Somerville, NJ.
4. AZ1500 resist thinner from Hoechst-Celanese, Somerville, NJ.
5. MF312 from Shipley Corp., Marlborough, MA.
6. K. Early, D. M. Tennant, D. Y. Jeon, P. P. Mulgrew, A. A. MacDowell, and O. R. Wood, J. Vac. Sci. Technol. B 10 (1992).
7. C. R. K. Marrian, F. K. Perkins, D. Park, E. A. Dobisz, M. C. Peckerar, K. W. Rhee, and R. Bass, J. Vac. Sci. Technol. B 14, 3864 (1996).
8. S. Pongratz, R. Demmeler, C. Ehrlich, K. Kohlmann, K. Rheimer, R. Dammel, W. Hessemer, J. Lingnau, U. Scheunemann, and J. Theis, Proc. SPIE 1089, 303 (1989).