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Volumn 198-200, Issue PART 1, 1996, Pages 474-477

Stability versus structure in glow discharge hydrogenated amorphous silicon obtained from a wide range of deposition conditions

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL BONDS; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; DEPOSITION; GLOW DISCHARGES; HELIUM; HYDROGEN; HYDROGENATION; KINETIC THEORY; LIGHT; MATHEMATICAL MODELS;

EID: 11744257059     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-3093(95)00739-3     Document Type: Article
Times cited : (10)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.