Effects of sputtering pressure on compositions and structures of fresnoite thin films

Physica B: Condensed Matter

Volumn 355, Issue 1-4, 2005, Pages 100-105

  Zhu, Mankang ^a   Liu, Liying ^a   Hou, Yudong ^a   Yan, Hui ^a   Xu, J B ^b   Shao, Mingming ^c   Chen, Xiaoyang ^c  

^a BEIJING UNIVERSITY OF TECHNOLOGY   (China)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

^c China   (China)

Author keywords

Fresnoite; Magnetron sputter; Thin film; Working pressure

Indexed keywords

ANNEALING TEMPERATURE; FRESNOITE; MAGNETRON SPUTTER; WORKING PRESSURE;

ACOUSTIC SURFACE WAVE DEVICES; ANNEALING; CRYSTALLOGRAPHY; ENERGY DISPERSIVE SPECTROSCOPY; FERROELECTRIC DEVICES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LATTICE CONSTANTS; MAGNETRON SPUTTERING; MICROSTRUCTURE; PRESSURE EFFECTS; STOICHIOMETRY; X RAY DIFFRACTION;

THIN FILMS;

EID: 11444250051     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2004.10.028     Document Type: Article

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