On the tunability of chemical reactions at metal-oxide interfaces

Surface Science

Volumn 574, Issue 2-3, 2005, Pages

  Fu, Qiang ^a   Wagner, Thomas ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

Diffusion at interface; Interfacial reaction; Metal oxide interface; Oxidation; Space charge; SrTiO 3; Thin film; X ray photoelectron spectroscopy (XPS)

Indexed keywords

DIFFUSION AT INTERFACES; INTERFACIAL REACTION; METAL-OXIDE INTERFACES; SRTIO3;

ELECTRIC SPACE CHARGE; ENERGY GAP; FERMI LEVEL; MATHEMATICAL MODELS; MOS DEVICES; OXIDATION; STRONTIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHROMIUM;

EID: 11444249524     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2004.11.007     Document Type: Article

References (25)

1. M. Rühle A.G. Evans M.F. Ashby J.P. Hirth Metal-ceramic interfaces 1990 Pergamon Oxford
2. J.M. Howe Int. Mater. Rev. 38 1993 233
3. V.E. Henrich, and P.A. Cox The Surface Science of Metal Oxides 1994 Cambridge University Press
4. U. Diebold, J.M. Pan, and T.E. Madey Surf. Sci. 331-333 1995 845
5. C.T. Campbell Surf. Sci. Rep. 27 1997 1
6. K. Sasaki, and J. Maier J. Appl. Phys. 86 1999 5422
7. N. Cabrera, and N.F. Mott Rep. Prog. Phys. 12 1949 163
8. I. Popova, V. Zhukov, and J.T. Yates Jr. Phys. Rev. Lett. 89 2002 276101
9. H.F. Winters, and D. Haarer Phys. Rev. B 36 1987 6613
10. C.G. Van de Walle, F.R. McFeely, and S.T. Pantelides Phys. Rev. Lett. 61 1988 1867
11. C.R. Henry Surf. Sci. Rep. 31 1998 235
12. M. Valden, X. Lai, and D.W. Goodman Science 281 1998 1647
13. S.A. Chambers, T. Droubay, D.R. Jennison, and T.R. Mattsson Science 297 2002 827
14. M. Kawasaki, K. Takahashi, T. Maeda, R. Tsuchiya, M. Shinohara, O. Ishiyama, T. Yonezawa, M. Yoshimoto, and H. Koinuma Science 266 1994 1540
15. V.E. Henrich, G. Dresselhaus, and H.J. Zeiger Phys. Rev. B 17 1978 4908
16. R. Moos, and K.H. Härdtl J. Am. Ceram. Soc. 80 1997 2549
17. R. Meyer, R. Waser, J. Helmbold, and G. Borchardt J. Electroceram. 9 2002 101
18. Q. Fu, and T. Wagner Surf. Sci. 505 2002 39
19. Q. Fu, and T. Wagner Phys. Rev. Lett. 90 2003 106105
20. R.H. Kingston, and S.F. Neustadter J. Appl. Phys. 26 1955 718
21. S.M. Sze Physics of Semiconductor Devices 1981 John Wiley & Sons
22. R.C. Weast M.J. Astle CRC Handbook of Chemistry and Physics 63rd ed. 1982 CRC Press
23. G.W. Dietz, W. Antpöhler, M. Klee, and R. Waser J. Appl. Phys. 78 1995 6113
24. W. Mönch Rep. Prog. Phys. 53 1990 221
25. J. Robertson J. Vac. Sci. Technol. B 18 2000 1785