Vapor pressures of precursors for the CVD of silicon-based films

Chemical Vapor Deposition

Volumn 10, Issue 1, 2004, Pages 20-22

  Alcott, Gregory R ^a   Van De Sanden, Richard M C M ^a   Kondic, Sascha ^b   Linden, Joannes L ^b  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b TNO   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; NUMERICAL METHODS; SILICON; THERMAL VARIABLES MEASUREMENT; THERMODYNAMIC STABILITY; THIN FILMS; TRANSPORT PROPERTIES; VAPORIZATION;

BISTRIMETHYL SILOXYETHANE; CLAUSIUS-CLAPEYRON EQUATION; GAS PHASE PROCESS TECHNOLOGY; TETRAETHOXYSILANE; TRIPROPYLSILANE;

VAPOR PRESSURE;

EID: 1142305347     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200306145     Document Type: Article

References (6)

1. C. I. M. A. Spee, F. Verbeek, J. G. Kraaijkamp, J. L. Linden, T. Rutten, H. Delhaye, E. A. Van de Zouwen, H. A. Meinema, Mater. Sci. Eng. 1993, B17, 108.
2. C. I. M. A. Spee, J. L. Linden, A. Mackor, K. Timmer, H. A. Meinema, Mater. Res. Soc. Symp. Proc. 1996, 93, 425.
3. E. Waffenschmidt, J. Musolf, M. Heuken, K. Heime, J. Supercond. 1992, 119, 5.
4. A. M. B. van Mol, J. P. A. M. Driessen, J. L. Linden, M. H. J. M. de Croon, C. I. M. A. Spee, J. C. Schouten, Chem. Vap Deposition 2001, 7, 101.
5. R. C. Weast, CRC Handbook of Chemistry and Physics 1st Student Ed., CRC Press, Boca Raton FL 1987
6. D. R. Stull, Ind. Eng. Chem. 1947, 39, 517.