Fabrication of epitaxial SiGe optical waveguide structures

Applied Surface Science

Volumn 224, Issue 1-4, 2004, Pages 175-178

  Kim, Yihwan ^a   Berlin, Dean ^a   Samoilov, Arkadii ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

Epitaxy; Photonics; Refractive index; Relaxed SiGe; SiGe waveguide; Transmission loss

Indexed keywords

CARBON; CLADDING (COATING); CRYSTALLINE MATERIALS; EPITAXIAL GROWTH; GERMANIUM; OXYGEN; REFRACTIVE INDEX; RELAXATION PROCESSES; SILICON COMPOUNDS; STRAIN; X RAY DIFFRACTION ANALYSIS;

BANDGAP ENERGY; PHOTONICS; RELAXED SIGE; SIGE WAVEGUIDE; TRANSMISSION LOSS;

OPTICAL WAVEGUIDES;

EID: 1142304528     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2003.08.099     Document Type: Conference Paper

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