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Volumn 23, Issue 7, 1997, Pages 520-522

Structural and noise characterization of VO2 films on SiO2/Si substrates

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EID: 0039329864     PISSN: 10637850     EISSN: None     Source Type: Journal    
DOI: 10.1134/1.1261815     Document Type: Article
Times cited : (4)

References (26)
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    • (1995) Phys. Solid State , vol.37 , pp. 1971
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    • P. Jin and S. Tanemura, Jpn. J. Appl. Phys. 33, Part. 1, 1478 (1994); 34, Part. 1, 2459 (1995).
    • (1995) Jpn. J. Appl. Phys. , vol.34 , Issue.PART. 1 , pp. 2459
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    • (Leningrad)Sov. Phys. Solid State 24, 1921 (1982)
    • Sh. M. Kogan and K. É. Nagaev, Fiz. Tverd. Tela (Leningrad) 24, 1921 (1982) [Sov. Phys. Solid State 24, 1921 (1982)].
    • (1982) Fiz. Tverd. Tela , vol.24 , pp. 1921
    • Kogan, Sh.M.1    Nagaev, K.E.2
  • 14
    • 0040397618 scopus 로고
    • Sh. M. Kogan and K. É. Nagaev, Fiz. Tverd. Tela (Leningrad) 24, 1921 (1982) [Sov. Phys. Solid State 24, 1921 (1982)].
    • (1921) Sov. Phys. Solid State , vol.24 , pp. 1921
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    • JCPDS International Center for Diffraction Data, Swarthmore, PA
    • JCPDS International Center for Diffraction Data, Swarthmore, PA.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.