Application of X-ray scattering methods to the analysis of Si-based heterostructures

Thin Solid Films

Volumn 450, Issue 1, 2004, Pages 138-142

  Woitok, J F ^a  

^a MALVERN INSTRUMENTS LTD   (United Kingdom)

Author keywords

Automatic fitting; High resolution X ray diffraction; SiGe; X ray diffuse scattering; X ray reflectivity

Indexed keywords

COMPOSITION; COMPUTER SIMULATION; CONCENTRATION (PROCESS); CURVE FITTING; DATA REDUCTION; EPITAXIAL GROWTH; LIGHT REFLECTION; MONOCHROMATORS; MULTILAYERS; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON; SUBSTRATES; SURFACE ROUGHNESS; X RAY ANALYSIS; X RAY DIFFRACTION; X RAY SCATTERING;

AUTOMATIC FITTING; HIGH-RESOLUTION X-RAY DIFFRACTION; X-RAY DIFFUSE SCATTERING;

HETEROJUNCTION BIPOLAR TRANSISTORS;

EID: 1142291770     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.10.058     Document Type: Conference Paper

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