On the use of exchange biased top electrodes in magnetic tunnel junctions

Journal of Magnetism and Magnetic Materials

Volumn 270, Issue 3, 2004, Pages 403-406

  Lacour, D ^a,b,d   Durand, O ^c   Maurice, J L ^a,b   Jaffres H ^a,b   Nguyen Van Dau, F ^a,b   Petroff, F ^a,b   Etienne, P ^c   Humbert, J ^a,b   Vaures A ^a,b  

^a Lab Collisions Atomiques M   (France)

^b UNIVERSITÉ PARIS SACLAY   (France)

^c THALES RESEARCH AND TECHNOLOGY   (France)

^d SAN JOSE RESEARCH CENTER   (United States)

Author keywords

Exchange bias; Magnetic tunnel junctions; Spin dependent tunnelling

Indexed keywords

ANTIFERROMAGNETIC MATERIALS; FERROMAGNETIC MATERIALS; MAGNETIC COUPLINGS; MAGNETIC FIELD EFFECTS; MAGNETIZATION; MICROSTRUCTURE; SPUTTERING; SQUIDS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

EXCHANGE BIAS; MAGNETIC TUNNEL JUNCTIONS (MTJ); RADIO FREQUENCY (RF) SPUTTERING; SPIN DEPENDENT TUNNELLING;

TUNNEL JUNCTIONS;

EID: 1142279601     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2003.09.007     Document Type: Article

References (8)

1. Prinz G.A. J. Magn. Magn. Mater. 200:1999;57.
2. Berkowitz A.E., Takano K. J. Magn. Magn. Mater. 200:1999;552.
3. Lacour D., Jaffrès H., Nguyen Van Dau F., Petroff F., Vaurès A., Humbert J. J. Appl. Phys. 91:2002;4655.
4. Leclair P., Swagten H.J.M., Kohlhepp J.T., van de Veerdonk R.J.M., de Jonge W.J.M. Phys. Rev. Lett. 84:2000;2933.
5. van Driel J., de Boer F.R., Lenssen K.-H.M., Coehoorn R. J. Appl. Phys. 88:2000;975.
6. Devasahayam A.J., Sides P.J., Kryder M.H. J. Appl. Phys. 83:1998;7216 Hoshino K., Nakatani R., Hoshiya H., Sugita Y. Jpn. J. Appl. Phys. Part 1. 35:1996;607 Nakatani R., Hoshiya H., Hoshino K., Sugita Y. J. Magn. Magn. Mater. 173:1997;321.
7. Devasahayam A.J., Sides P.J., Kryder M.H. J. Appl. Phys. 83:1998;7216 Hoshino K., Nakatani R., Hoshiya H., Sugita Y. Jpn. J. Appl. Phys. Part 1. 35:1996;607 Nakatani R., Hoshiya H., Hoshino K., Sugita Y. J. Magn. Magn. Mater. 173:1997;321.
8. Devasahayam A.J., Sides P.J., Kryder M.H. J. Appl. Phys. 83:1998;7216 Hoshino K., Nakatani R., Hoshiya H., Sugita Y. Jpn. J. Appl. Phys. Part 1. 35:1996;607 Nakatani R., Hoshiya H., Hoshino K., Sugita Y. J. Magn. Magn. Mater. 173:1997;321.