Study of the chemical and structural organization of SIPOS films at the nanometer scale by TEM-EELS and XPS

Materials Science and Engineering: B

Volumn 107, Issue 1, 2004, Pages 58-65

  Schamm, S ^a   Berjoan, R ^b   Barathieu, P ^c  

^a CEMES CNRS   (France)

^b IMP   (France)

^c MOTOROLA INC   (United States)

Author keywords

Electron energy loss spectroscopy (EELS); Semi insulating polycrystalline silicon (SIPOS); Semiconductor devices; Thin films; Transmission electron microscopy; X ray spectroscopy

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; COMPOSITION; ELECTRON ENERGY LOSS SPECTROSCOPY; OXIDATION; POLYCRYSTALLINE MATERIALS; SILICON; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

HIGH VOLTAGE BIPOLAR TRANSISTORS; POST-DEPOSITION ANNEALING;

THIN FILMS;

EID: 1142276029     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2003.10.010     Document Type: Article

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