Low-pressure chemical vapor deposition of semi-insulating polycrystalline silicon thin films I. experimental study and proposal of new kinetic laws

Journal of the Electrochemical Society

Volumn 148, Issue 3, 2001, Pages

  Barathieu, P ^a   Caussat, B ^a   Scheid, E ^a   Jaume, D ^a   Couderc, J P ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0347263988     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1346601     Document Type: Article

References (5)

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