A sectional model for investigating microcontamination in a rotating disk CVD reactor

Aerosol Science and Technology

Volumn 38, Issue 12, 2004, Pages 1161-1170

  Sun, Z ^a,c   Axelbaum, R L ^a   Davis, R W ^b  

^a WASHINGTON UNIVERSITY IN ST LOUIS   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^c LHP Software LLC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AEROSOLS; CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; DATA ACQUISITION; NUCLEATION; PARTICLE SIZE ANALYSIS;

AEROSOL DYNAMICS; MICROCONTAMINATION; ROTATING DISK CVD REACTOR; THERMOPHORETIC VELOCITIES;

ROTATING DISKS;

AEROSOL; ARTICLE; CHEMISTRY; CONTAMINATION; DRY DEPOSITION; FLOW RATE; PARTICLE SIZE; PRESSURE CHAMBER; PRIORITY JOURNAL; REACTOR; REACTOR DESIGN; TEMPERATURE; THICKNESS;

EID: 11344261224     PISSN: 02786826     EISSN: None     Source Type: Journal    
DOI: 10.1080/027868290896799     Document Type: Article

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