Study on EUV emission properties of Laser-Produced Plasma at ILE, Osaka

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5196, Issue , 2004, Pages 289-297

  Nakai, Mitsuo ^a   Nishimura, Hiroaki ^a   Shigemori, Keisuke ^a   Miyanaga, Noriaki ^a   Norimatsu, Takayoshi ^a   Nagai, Keiji ^a   Matsui, Ryoji ^a   Hibino, Takahiro ^a   Okuno, Tomoharu ^a   Sohbatzadeh, F S ^a   Tao, Y ^a   Hashimoto, Kazuhisa ^a   Yamaura, Michiteru ^a   Fujioka, Sinsuke ^a   Nagatomo, Hideo ^a   Zhakhovckii, Vasilli ^a   Nishihra, Katsunobu ^a   Uchida, Shigeaki ^b   Shimada, Yoshinori ^b   Furukawa, Hiroyuki ^b   Nakatsuka, Masahiro ^a   Izawa, Yasukazu ^a   more..

^a OSAKA UNIVERSITY   (Japan)

^b INSTITUTE FOR LASER TECHNOLOGY   (Japan)

Author keywords

EUV source generation; Experimental database; Laser produced plasma; Uniform illumination

Indexed keywords

ENERGY DISPERSIVE SPECTROSCOPY; LITHOGRAPHY; PROJECT MANAGEMENT; SCATTERING; SPECTROMETERS; X RAYS;

EUV SOURCE GENERATION; EXOERIMENTAL DATABASE; UNIFORM ILLUMINATION;

LASER PRODUCED PLASMAS;

EID: 11144358543     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504166     Document Type: Conference Paper

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