Large positive magnetoresistance in nonstoichiometric NiMnSb thin films on silicon

Applied Physics Letters

Volumn 84, Issue 13, 2004, Pages 2358-2360

  Branford, W R ^a   Clowes, S K ^a   Syed, M H ^a   Bugoslavsky, Y V ^a   Gardelis, S ^b   Androulakis, J ^b   Giapintzakis, J ^b   Grigorescu, C E A ^c   Berenov, A V ^d   Roy, S B ^e   Cohen, L F ^a  

^a IMPERIAL COLLEGE LONDON   (United Kingdom)

^b INSTITUTE OF ELECTRONIC STRUCTURE AND LASER   (Greece)

^c Natl Res/Devmt Inst M   (ROM)

^d UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^e RAJA RAMANNA CENTRE FOR ADVANCED TECHNOLOGY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; ELECTRONS; HALL EFFECT; IRON COMPOUNDS; MAGNETIC FIELD EFFECTS; MAGNETOMETERS; MAGNETORESISTANCE; MULTILAYERS; NICKEL COMPOUNDS; PULSED LASER DEPOSITION; SILICON; SURFACE PROPERTIES; THERMAL EFFECTS;

CHALCOGENIDES; FERRMAGNETS; HALL RESISTIVITY; SURFACE RECONSTRUCTION;

THIN FILMS;

EID: 11144355102     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1691172     Document Type: Article

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