Nitrogen rich carbon nitride thin films deposited by hybrid PLD technique

Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals

Volumn 374, Issue , 2002, Pages 207-210

  Jelínek, Miroslav ^a   Kulisch, Wilhelm ^b   Lančok, Ján ^a   Popov, Cyril ^b   Bulíř, Jiří ^a,c   Delplancke Ogletree, M P ^c  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b UNIVERSITY OF KASSEL   (Germany)

^c UNIVERSITÉ LIBRE DE BRUXELLES   (Belgium)

Author keywords

Carbon nitride; Hollow cathode discharge; Laser deposition; Radiofrequency discharge

Indexed keywords

ALUMINUM; CARBON NITRIDE; CATHODES; CONTAMINATION; DEPOSITION; EXCIMER LASERS; FREQUENCIES; NITROGEN; PULSED LASER DEPOSITION;

ACTIVATED NITROGEN; ALUMINUM CONTAMINATION; HOLLOW CATHODE DISCHARGE; RADIOFREQUENCY (RF) DISCHARGE;

THIN FILMS;

EID: 11144325661     PISSN: 1058725X     EISSN: None     Source Type: Journal    
DOI: 10.1080/10587250210478     Document Type: Conference Paper

References (5)

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3. M. L. Cohen, Materials Science and Engineering A 209, 1 (1996).
4. Ch.M. Sung, M. Sung, Mater. Chem. Phys. 43, 1 (1996).
5. M. Jelínek, W. Kulisch, M.P. Delplancke-Ogletree, J. Lančok, L. Jastrabík, C. Popov, J. Bulíř, Appl. Phys. A 73, 167 (2001).