Exploiting poly(dimethylsiloxane)-modified tips to evaluate frictional behavior by friction force microscopy

Langmuir

Volumn 20, Issue 26, 2004, Pages 11499-11503

  Cho, Jeong Ho ^a   Lee, Dae Ho ^a   Shin, Hwa Sung ^a   Pattanayek, Sudip K ^a   Ryu, Chang Y ^b   Cho, Kilwon ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Research Rensselaer Polytechnic Institute   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FRICTION COEFFICIENTS; FRICTION FORCE MICROSCOPY; POLY(DIMETHYLSILOXANE) (PDMS); SURFACE PENETRATION;

ATOMIC FORCE MICROSCOPY; FRICTION; HARDNESS; MONOLAYERS; SCANNING ELECTRON MICROSCOPY; VISCOELASTICITY;

SILICONES;

FRICTION; FUNCTIONAL GROUPS; HARDNESS; MONOLAYERS; POLYSILICONES; SCANNING ELECTRON MICROSCOPY; VISCOELASTICITY;

EID: 11144241807     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la048409f     Document Type: Article

References (28)

1. Tu, J. K.; Talghader, J. J.; Hadley, M. A.; Smith, J. S. Electron. Lett. 1995, 31, 1448.
2. Talghader, J. J.; Tu, J. K.; Smith, J. S. IEEE Photon. Technol. Lett. 1995, 7, 1321.
3. Hawe, R. T. J. Vac. Sci. Technol., B 1988, 6, 1809.
4. Fan, L. S.; Tai, Y. C. Sens. Actuators 1989, 20, 41.
5. Mehregancy, M.; Tai, Y. C. J. Micromech. Microeng. 1991, 1, 73.
6. Mehregancy, M. Circuits Devices 1993, 14.
7. Frisbie, C. D.; Rozsnyai, L. F.; Noy, A.; Wrighton, M. S.; Lieber, C. M. Science 1994, 265, 2071.
8. Green, J. D.; McDermott, M. T.; Porter, M, D.; Siperko, L. M. J. Phys. Chem. 1995, 99, 10960.
9. Fujiwara, I.; Kamei, T.; Tanaka, K. J. Appl. Phys. 1998, 78, 4189.
10. Noy, A.; Frisbie, C. D.; Rozsnyai. L. F.; Wrighton, M. S.; Lieber, C. M. J. Am. Chem. Soc. 1995, 117, 7943.
11. Xiao, X.; Hu, J.; Charych, D. H.; Salmeron, M. Langmuir 1996, 12, 235.
12. van der Vegte, E. W.; Hadziioannou, G. Langmuir 1997, 13, 4357.
13. Tsukruk, V. V.; Bliznyuk, V. N. Langmuir 1998, 14, 446.
14. Beake, B. D.; Leggett, G. J. Phys. Chem. Chem. Phys. 1999, 1, 3345.
15. Yang, X.; Perry, S. S. Langmuir 2003, 16, 6135.
16. Lee, D. H.; Kim, D.; Oh, T.; Cho, K. Langmuir 2004, 20, 8124.
17. McCarthy, T. J.; Fadeev, A. Y. Langmuir 2000, 16, 7268.
18. More, S. D.; Graaf, H.; Baune, M.; Wang, C.; Urisu, T. Jpn. J. Appl.Phys. 2002, 47, 4390.
19. Lee, D. H.; Kim, D.; Oh, T.; Cho, K. In preparation.
20. Carpick, E. W.; Salmeron, M. Chem. Rev. 1997, 97, 1163.
21. Leggett, G. J. Anal. Chim. Acta 2003, 479, 17.
22. Neumeister, J. M.; Ducker, W. A. Rev. Sci. Instrum. 1994, 65, 2527.
23. Timoshenko, S. P.; Goodier, J. N. Theory of Elasticity; McGrawHill Int. Book Co.: New York, 1984.
24. Iimura, K.; Nakajima, Y.; Kato, T. Thin Solid Films 2000, 379, 230.
25. Rye, R. R. Langmuir 1997, 13, 2588.
26. Berman, A.; Drummond, C.; Israelachvili, J. Tribol. Lett. 1998, 4, 95.
27. Schwarz, U. D.; Allers, W.; Gensterblum, G.; Wiesendanger, R. Phys. Rev. B 1998, 52, 14977.
28. Clear, S. C.; Nealey, P. P. J. Colloid Interface Sci. 1999, 213, 238.