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Volumn 11, Issue 11, 2004, Pages 5350-5353
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Effect of metastable atoms on near-wall voltage drop in the afterglow of a noble-gas radio-frequency inductive coupled plasma
a b c
a
UES INC
(United States)
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRON ENERGY;
INDUCTIVE COUPLED PLASMA (ICP);
METASTABLE ATOMS;
PLASMA PROCESSING;
ELECTRIC POTENTIAL;
ELECTRON ENERGY LEVELS;
ELECTRONS;
FREQUENCIES;
INERT GASES;
IONS;
PHASE TRANSITIONS;
PLASMAS;
TEMPERATURE DISTRIBUTION;
ATOMS;
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EID: 10944271735
PISSN: 1070664X
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1795844 Document Type: Article |
Times cited : (6)
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References (16)
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