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Volumn 151, Issue 12, 2004, Pages
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Second-order normal force brought about by polishing with a polyurethane pad
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Author keywords
[No Author keywords available]
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Indexed keywords
LITHOGRAPHY;
LOADS (FORCES);
OXIDES;
PARAMETER ESTIMATION;
RHEOLOGY;
SILICA;
STRAIN;
HYDRODYNAMIC POLISHING;
NONLINEARITY;
SHALLOW TRENCH ISOLATION (STI);
SHEAR RATE;
CHEMICAL MECHANICAL POLISHING;
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EID: 10844279982
PISSN: 00134651
EISSN: None
Source Type: Journal
DOI: 10.1149/1.1812738 Document Type: Article |
Times cited : (4)
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References (16)
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