Fabrication of 128×128 element optical switch array by micromachining technology

Microelectronics Journal

Volumn 36, Issue 1, 2005, Pages 91-95

  Wang, S B ^a   Zhou, S B ^a   Huang, G ^a   Xiong, B F ^a   Chen, S H ^a   Yi, X J ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

128 128 Element; Infrared optical switch array; Ion beam sputtering; Photolithography; Temperature coefficient of resistance; Vanadium oxide thin films

Indexed keywords

INFRARED OPTICAL SWITCH ARRAYS; ION BEAM SPUTTERING; VANADIUM OXIDE THIN FILMS;

INFRARED RADIATION; ION BEAMS; LITHOGRAPHY; MICROMACHINING; PHOTOLITHOGRAPHY; THIN FILMS; VANADIUM COMPOUNDS;

OPTICAL SWITCHES;

EID: 10844264118     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mejo.2004.06.024     Document Type: Article

References (10)

1. G.A. Rozgonyi, and D.H. Hensler Structure and electrical properties of vanadium dioxide thin films J. Vac. Sci. Technol. 5 6 1968 194 199
2. 2 thin films J. Appl. Phys. 66 12 1989 5844 5850
3. H. Ermine, F. Picard, and D. Vincent Vanadium oxide films forms for optical switching and detection Opt. Eng. 32 9 1993 2092 2099
4. M.S. Burdis Properties of sputtered thin films of vanadium-titanium oxide for use in electrochromic windows Thin Solid Films 311 1997 286 298
5. 2-based thin films bolometer Acta Phys. Sinica 50 3 2001 136 138 (in Chinese) 50(3) (2001) 136-138
6. x thin film Infrared Phys. Technol. 42 2 2001 87 90
7. R.A. Wood High-performance infrared thermal imaging with monolithic silicon focal planes operating at room temperature IEEE IEDM 1993 175 177
8. 2 films J. Vac. Sci. Technol. A2 4 1984 1509 1512
9. B.E. Cole, and R.E. Higashi Micromachined pixel arrays integrated with CMOS for infrared applications IEEE 2000 63
10. 5 xerogels. Intercalated polypyrrole Polym. Mater. Sci. Eng. 61 1989 969 973