The critical layer number of epitaxially grown Cu and Ni films with strained structure

Applied Surface Science

Volumn 239, Issue 3-4, 2005, Pages 259-261

  Li, J C ^a   Liu, W ^a   Jiang, Q ^a  

^a JILIN UNIVERSITY   (China)

Author keywords

Critical thickness; Elastic energy; Interface energy; Metallic film

Indexed keywords

ELASTICITY; ENTHALPY; MATRIX ALGEBRA; MELTING; METALLIC FILMS; STRESSES; THERMODYNAMIC PROPERTIES; THIN FILMS;

CRITICAL THICKNESS; ELASTIC ENERGY; ELASTIC THEORY; INTERFACE ENERGY;

EPITAXIAL GROWTH;

EID: 10644249854     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.05.294     Document Type: Article

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