Composition and density of non-thickness-limited anodic films on aluminium and tantalum

Thin Solid Films

Volumn 471, Issue 1-2, 2005, Pages 118-122

  Lu, Q ^a   Skeldon, P ^a   Thompson, G E ^a   Habazaki, H ^b   Shimizu, K ^c  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

^b HOKKAIDO UNIVERSITY   (Japan)

^c KEIO UNIVERSITY   (Japan)

Author keywords

Aluminium; Anodic films; Anodizing; NTL; Tantalum

Indexed keywords

ANODES; ANODIC OXIDATION; ELECTROLYTES; ENERGY DISPERSIVE SPECTROSCOPY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; TANTALUM; TRANSMISSION ELECTRON MICROSCOPY;

ANODIC FILMS; NON-THICKNESS-LIMITED (NTL); SUBSTRATE SURFACE; SUBTLE TEXTURE;

ALUMINUM;

EID: 10644239265     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.04.061     Document Type: Article

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