Non-Thickness-Limited Growth of Anodic Oxide Films on Tantalum

Journal of the Electrochemical Society

Volumn 148, Issue 9, 2001, Pages

  Li, Y M ^a   Young, L ^a  

^a UNIVERSITY OF BRITISH COLUMBIA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001432682     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1386387     Document Type: Article

References (12)

1. B. Melody, T. Kinard, and P. Lessner, Electrochem. Solid-State Lett., 1, 126 (1998).
2. L. Young, Anodic Oxide Films, Academic Press, London (1961).
3. L. Young, Trends in Electrochem., 1, 259 (1992).
4. A. F. Torrisi, J. Electrochem. Soc., 102, 176 (1955).
5. L. Young, Proc. R. Soc. London, Ser. A, 244, 41 (1958).
6. Y.-M. Li and L. Young, J. Electrochem. Soc., 147, 1344 (2000).
7. R. E. Pawel, Rev. Sci. Instrum., 35, 1066 (1964).
8. L. Young, Proc. R. Soc. London, Ser. A, 258, 496 (1960).
9. W. D. Cornish and L. Young, Proc. R. Soc. London, Ser. A, 335, 34 (1973).
10. L. Young, Anodic Oxide Films, p. 129, Academic Press, London (1961).
11. R. C. Evans, An Introduction to Crystal Chemistry, p. 291, Cambridge, U.K. (1939).
12. J. A. Davies, J. P. S. Pringle, R. I. Graham, and F. Brown, J. Electrochem. Soc., 109, 999 (1962) (see Ref. 3 for a review).