UV-VIS and mid-IR ellipsometer characterization of layers used in OLED devices

Journal of Luminescence

Volumn 110, Issue 4 SPEC. ISS., 2004, Pages 407-412

  Hartmann, E ^a   Boher, P ^a   Defranoux, Ch ^a   Jolivet, L ^a   Martin, M O ^a  

^a SOPRA   (France)

Author keywords

Dopant molecules; Electrical properties; Layer thickness; OLED; Optical indices; Spectroscopic ellipsometry

Indexed keywords

CHARACTERIZATION; ELECTROLUMINESCENCE; ELLIPSOMETRY; INFRARED RADIATION; MAGNETOELECTRIC EFFECTS; OPTIMIZATION; THIN FILMS;

DOPANT MOLECULES; ELECTRICAL PROPERTIES; LAYER THICKNESS; OPTICAL INDICES; ORGANIC LIGHT-EMITTING DIODES (OLED); SPECTROSCOPIC ELLIPSOMETRY;

LIGHT EMITTING DIODES;

EID: 10444275829     PISSN: 00222313     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jlumin.2004.08.039     Document Type: Conference Paper

References (18)

1. Y. He, R. Hattori, J. Kanicki, IEEE Trans. Electron. Dev. 48 (2001) 1322.
2. Y. He, R. Hattori, J. Kanicki, Jpn. J. Appl. Phys. 40 (2001) 1199.
3. P. Servati, S. Prakash, A. Nathan, C. Py, J. Vac. Sci. Technol. A 20 (2002) 1374.
4. C.W. Tang, S.A. VanSlyke, J. Appl. Phys. 65 (1989) 3610.
5. L.S. Hung, C.W. Tang, M.G. Mason, Appl. Phys. Lett. 70 (1997) 152.
6. T. Dobbertin, M. Kroeger, D. Heithecker, D. Schneider, D. Metzdorf, H. Neuner, E. Becker, H.-H. Johannes, W. Kowalsky, Appl. Phys. Lett. 82 (2003) 284.
7. C.W. Tang, S.A. VanSlyke, Appl. Phys. Lett. 51 (1987) 913.
8. X. Zhou, M. Pfeiffer, J.S. Huang, J. Blochwitz-Nimoth, D.S. Qin, A. Werner, J. Drechsel, B. Maenning, K. Leo, Appl. Phys. Lett. 81 (2002) 922.
9. W. Kowalsky, T. Benstem, A. Böhler, S. Dirr, H.-H. Johannes, D. Metzdorf, H. Neuner, J. Schöbel, SPIE Conference on Light-Emitting Diodes: Research, Manufacturing, and Applications III, 27-28 January 1999, San Jose, California, p. 103.
10. V. Bulovic, A. Shonstikov, M.A. Baldo, E. Bose, V.G. Kozlov, M.E. Thompson, S.R. Forrest, Chem. Phys. Lett. 287 (1998) 455.
11. R.M.A. Azzam, N.M. Bashara, Ellipsometry and Polarized Light, North-Holland, New York, 1988.
12. P.K.L. Drude, Annalen der Physik 1 (1900) 566; P.K.L. Drude, Annalen der Physik 3 (1900) 369.
13. P.K.L. Drude, Annalen der Physik 1 (1900) 566; P.K.L. Drude, Annalen der Physik 3 (1900) 369.
14. C.M. Wolfe, N. Holonyak, G.E. Stillmann, Physical Properties of Semiconductors, Prentice-Hall, Englewood Cliffs, NJ, 1989.
15. W.H. Press, B.P. Flannery, S.A. Teukolsky, W.T. Vetterling, Numerical Recipes: The Art of Scientific Computing, Cambridge University Press, Cambridge, MA, 1988.
16. -1).
17. N. Karl, Mater Sci. 10 (1984) 365.
18. Product line of JDS Uniphase Corporation, San Jose, CA, USA (www.ocli.com, see LowOhm™ Coatings Data Sheet for Transparent Conductive Coatings).