Hydrogen loading and UV-irradiation induced etch rate changes in phosphorus-doped fibers

Optics Express

Volumn 12, Issue 23, 2004, Pages 5770-5776

  Durr F ^a   Kulik, G ^a   Limberger, H G ^a   Salathe R P ^a   Semjonov, S L ^b   Dianov, E M ^b  

^a EPFL   (Switzerland)

^b FIBER OPTICS RESEARCH CENTER   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

COLOR CENTERS; CONCENTRATION (PROCESS); DOPING (ADDITIVES); ETCHING; IRRADIATION; PHOSPHORUS; ULTRAVIOLET RADIATION;

CHEMICAL ETCHING; ETCH RATE; FIBER CHARACTERIZATION; GLASS AND OTHER AMORPHOUS MATERIALS;

OPTICAL FIBERS;

EID: 10444231228     PISSN: 10944087     EISSN: None     Source Type: Journal    
DOI: 10.1364/OPEX.12.005770     Document Type: Article

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