Developing supercritical carbon dioxide processing in microelectronics applications

MICRO

Volumn 22, Issue 1, 2004, Pages 33-38

  Case, Christopher ^a   McClain, James ^b  

^a BOC Edwards   (United Kingdom)

^b Micell Technologies   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DOW CHEMICALS (CO); JSR (CO); MEMS DEVICES; MICROELECTRONICS CLEANING; SUPERCRITICAL CARBON DIOXIDE;

CARBON DIOXIDE; CHEMICAL CLEANING; COPPER; COSTS; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); DRYING; LITHOGRAPHY; MICROEMULSIONS; PERMITTIVITY; POTASH; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SUPERCRITICAL FLUIDS; TRANSMISSION ELECTRON MICROSCOPY;

MICROELECTRONIC PROCESSING;

EID: 1042292860     PISSN: 10810595     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Review

References (5)

1. The International Technology Roadmap for Semiconductors (San Jose: SIA, 2001).
2. JB McClain et al., "Design of Nonionic Surfactants for Supercritical Carbon Dioxide," Science 274 (1996): 2049-2052.
3. JL Fulton et al., "Aggregation of Amphiphilic Molecules in Supercritical Carbon Dioxide: A Small Angle X-Ray Scattering Study," Langmuir 11 (1995): 4241-4249.
4. KP Johnston et al., "Water-in-Carbon Dioxide Microemulsions: A New Environment for Hydrophiles Including Proteins," Science 271 (1996): 624-626.
5. 2 Cleaning Processes for BEOL Applications: Post Barrier Breakthrough," in Proceedings of the Electrochemical Society Meeting (Pennington, NJ: Electrochemical Society, 2003), in press.