RF aerosol plasma fabrication of indium tin oxide and tin oxide thin films

Journal of Materials Research

Volumn 11, Issue 4, 1996, Pages 895-903

  Lee, D H ^a   Vuong, K D ^a   Williams, J A A ^a   Fagan, J ^a   Condrate Sr , R A ^a   Wang, X W ^a  

^a ALFRED UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; FILM PREPARATION; GLASS; LIGHT TRANSMISSION; MORPHOLOGY; PLASMA APPLICATIONS; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTING TIN COMPOUNDS; THERMAL EFFECTS; THIN FILMS;

INDIUM TIN OXIDE; TIN OXIDE;

CONDUCTIVE FILMS;

EID: 0030129193     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1996.0111     Document Type: Article

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