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Volumn 5488, Issue PART 2, 2004, Pages 813-819

Development of multilayer coatings (Ni/C - Pt/C) for hard X-ray telescopes by e-beam evaporation with ion assistance

Author keywords

E beam evaporation; Hard x ray mirrors; Multilayer coatings; Ni electroforming replication

Indexed keywords

ASTRONOMY; COATINGS; ION BEAM ASSISTED DEPOSITION; MIRRORS; NICKEL; REFLECTION; TELESCOPES;

EID: 10044296317     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.568751     Document Type: Conference Paper
Times cited : (13)

References (15)
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  • 6
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    • Development of of soft and hard X-ray optics for astronomy: Progress report 2 and considerations on material properties for large-diameter segmented optics of future missions
    • Citterio et al., "Development of of soft and hard X-ray optics for astronomy: progress report 2 and considerations on material properties for large-diameter segmented optics of future missions", SPIE Proc., 4496, 23 (2001)
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  • 9
    • 1842689676 scopus 로고    scopus 로고
    • Soft (0.1 - 10 keV) and hard (>10 keV) x-ray multilayer mirrors for the XEUS astronomical mission
    • G. Pareschi, V. Cotroneo, "Soft (0.1 - 10 keV) and hard (>10 keV) x-ray multilayer mirrors for the XEUS astronomical mission", SPIE Proc. 5168, 53 (2004)
    • (2004) SPIE Proc. , vol.5168 , pp. 53
    • Pareschi, G.1    Cotroneo, V.2
  • 10
    • 0033698688 scopus 로고    scopus 로고
    • Nickel replicated multilayer optics for soft and hard X-ray telescopes
    • G. Pareschi, et al., "Nickel replicated multilayer optics for soft and hard X-ray telescopes", SPIE Proc., 4012, 284 (2000)
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    • Pareschi, G.1
  • 11
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    • Stress mitigation in Mo/Si multilayers for EUV lithography
    • E. Zoethout et al., "Stress Mitigation in Mo/Si Multilayers for EUV Lithography", SPIE Proc., 5037, 872 (2003)
    • (2003) SPIE Proc. , vol.5037 , pp. 872
    • Zoethout, E.1
  • 12
    • 0027803427 scopus 로고    scopus 로고
    • Developements in ion assisted multilayer coatings
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    • Culver, T.R.1
  • 14
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    • Defects from substrate particles depend on the sputter deposition process
    • nov
    • D. G. Stearns et al., "Defects from substrate particles depend on the sputter deposition process", Solid State Technology, nov 2000, 95
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  • 15


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.