Influence of the gas phase composition on nanocrystalline diamond films prepared by MWCVD

Journal of Metastable and Nanocrystalline Materials

Volumn 23, Issue , 2005, Pages 31-34

  Popov, C ^a   Jelinek, M ^b   Boycheva, S ^a,c   Vorlicek, V ^b   Kulisch, W ^a  

^a UNIVERSITY OF KASSEL   (Germany)

^b INSTITUTE OF PHYSICS   (Czech Republic)

^c TECHNICAL UNIVERSITY OF SOFIA   (Bulgaria)

Author keywords

Characterization; Microwave Plasma CVD; Nanocrystalline Diamond Films

Indexed keywords

CHARACTERIZATION; COMPOSITION; CONCENTRATION (PROCESS); DIAMOND FILMS; GRAIN SIZE AND SHAPE; METHANE; MICROWAVES; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

DIAMOND GRAINS; MACROSCOPIC STRUCTURE; MICROWAVE PLASMA CVD; NANOCRYSTALLINE DIAMOND FILMS;

NANOSTRUCTURED MATERIALS;

EID: 10044245526     PISSN: 14226375     EISSN: None     Source Type: Journal    
DOI: 10.4028/www.scientific.net/JMNM.23.31     Document Type: Conference Paper

References (8)

1. D. Zhou, D.M. Gruen, L.C. Qin, T.G. McCauley and A.R. Krauss: J. Appl. Phys. Vol. 84 (1998) p.1981
2. S.A Catledge and Y.K. Vohra: J. Appl. Phys. Vol. 84 (1998) p. 6469
3. S. Jin and T.D. Moustakas, Appl. Phys. Lett. Vol. 65 (1994) p. 403
4. R. Locher, C. Wild, N. Herres, D. Behr and P. Koidl: Appl. Phys. Lett. Vol. 65 (1994) p. 34
5. K. Wu, E.G. Wang, Z.X. Cao, Z.L. Wang and X. Jiang: J. Appl. Phys. Vol. 88 (2000) p. 2967
6. T.H. de Keijser, E.J. Mittermeijer and H.C. Rozendaal: J. Appl. Cryst. Vol. 16 (1983) p. 309
7. R.J. Nemanich, J.T. Glass, G. Lucovsky and R.E. Shroder: J. Vac. Sci. Technol. A Vol. 6 (1988) p. 1783
8. A.C. Ferrari and J. Robertson: Phys. Rev. B Vol. 63 (2001) p. 121405