UV and DUV microscopy for dimensional metrology on micro- and nanostructures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5457, Issue , 2004, Pages 35-43

  Bodermann, Bernd ^a   Ehret, Gerd ^a   Mirandé, Werner ^a  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

Dark field microscopy; Microstructure measurement; UV microscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; MEASUREMENTS; MICROSCOPIC EXAMINATION; MICROSTRUCTURE; OPTICAL IMAGE STORAGE; OPTICAL MICROSCOPY; SCANNING ELECTRON MICROSCOPY;

CONTRAST MECHANISMS; DARK FIELD MICROSCOPY; MICROSTRUCTURE MEASUREMENT; UV MICROSCOPY;

NANOSTRUCTURED MATERIALS;

EID: 10044237802     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.554747     Document Type: Conference Paper

References (10)

1. W. Mirandé, C.G. Frase, H. Bosse: "Comparison of optical and SEM photomask linewidth measurements", Proc. of the 4th Seminar on Quantitative Microscopy QM 2000, PTB-Bericht, PTB-F-39, 66-74 (2000)
2. H. Bosse, W. Mirandé, C.G. Frase, H.-J. Brück, S. Lehningk: "Comparison of linewidth measurements on COG masks", EMC 2000; 17th European mask conference on mask technology for integrated circuits and micro-components, GMM-Fachbericht, 32, 111-119 (2000)
3. J. Nunn, W. Mirandé, H. Jakobsen, N. Talene: "Challenges in the calibration of a linewidth standard developed fort the European commission", GMM Fachbericht 21, (1997), 53-68
4. M. G. Moharam, E. B. Grann, D. A. Pommet, T. K. Gaylord: "Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings", JOSA A 12, (1995), 1068-1076
5. M. G. Moharam, E. B. Grann, D. A. Pommet, T. K. Gaylord: "Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach", JOSA A 12, (1995), 1077-1086
6. P. Lalanne, G. M. Morris: "Highly improved convergence of the coupled-wave method for TM-polarizastion", JOSA A 13, (1996), 779-784
7. M. Totzeck: "Numerical simulation of high-NA quantitative polarization microscopy and corresponding near-fields", Optik 112, (2001), 399-406
8. st Seminar on Nanoscale Calibration Standards and Methods, PTB-report: PTB-F-44, (2001), 198-203
9. B. Bodermann, W. Michaelis, A. Diener, W. Mirandé: "Alternating grazing incidence dark field microscopy for dimensional measurements", Proc. of SPIE 4277, (2002), 352-361
10. th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components, GMM-Fachbericht 39, VDE Verlag, (2003),47-52