Comparison of structure and electron-field-emission behavior of chemical-vapor-deposited diamond and pulsed-laser-deposited diamond-like carbon films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 4 A, 2000, Pages 1866-1871

  Cheng, Hsiu Fung ^a   Chen, Yi Chun ^a   Wang, Yin Ling ^a   Chen, Yuan Yu ^a   Tsau, Bor Jau ^b   Chen, Tang ^b   Lin, I Nan ^b  

^a NATIONAL TAIWAN NORMAL UNIVERSITY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Chemical vapor deposition; Diamond like carbon films and diamond films; Electron field emission; Pulsed laser deposition

Indexed keywords

EID: 0942305792     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.1866     Document Type: Article

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