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Volumn 58, Issue 7-8, 2004, Pages 1331-1335

Double-positioning twinning in icosahedral B12As2 thin films grown by chemical vapor deposition

Author keywords

Boron arsenide; Epitaxial growth; Semiconductors; Transmission electron microscopy; Triple axis diffractometry; X ray topography

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; COMMINUTION; DIFFRACTOMETERS; EPITAXIAL GROWTH; HYDRIDES; RADIATION; SEMICONDUCTOR MATERIALS; SYNCHROTRONS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; TWINNING; X RAY DIFFRACTION ANALYSIS;

EID: 0942299319     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2003.09.042     Document Type: Article
Times cited : (16)

References (9)
  • 4
    • 0942276942 scopus 로고    scopus 로고
    • US Patent No. 6,479,919, April 9, 2001
    • T.L. Aselage, D. Emin, US Patent No. 6,479,919, April 9, 2001.
    • Aselage, T.L.1    Emin, D.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.