Effect of oxygen partial pressure on the NTCR characteristics of sputtered NixMn3-xO4+δ thin films

Journal of the European Ceramic Society

Volumn 24, Issue 6, 2004, Pages 1247-1250

  Basu, A ^a   Brinkman, A W ^a   Schmidt, R ^a  

^a DURHAM UNIVERSITY   (United Kingdom)

Author keywords

Nickel manganate; NTC; Spinel; Sputtering

Indexed keywords

ANNEALING; ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; NICKEL COMPOUNDS; OXYGEN; PARTIAL PRESSURE; THERMAL EFFECTS; THIN FILMS;

NEGATIVE TEMPERATURE COEFFICIENT OF RESISTIVITY (NTCR); OXYGEN PARTIAL PRESSURE;

CERAMIC MATERIALS;

CERAMICS; OXYGEN;

EID: 0942289078     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0955-2219(03)00380-7     Document Type: Article

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