Morphological stability in epitaxially strained films on a substrate with finite thickness

Journal of Physics D: Applied Physics

Volumn 37, Issue 2, 2004, Pages 240-248

  Lu, Jian Ming ^a   Su, Ming Horng ^b   Chang, Jee Gong ^c   Hwang, Chi Chuan ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b WUFENG INSTITUTE OF TECHNOLOGY   (Taiwan)

^c NATIONAL CENTER FOR HIGH PERFORMANCE COMPUTING   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY CONDITIONS; DISLOCATIONS (CRYSTALS); EPITAXIAL GROWTH; INTERFACES (MATERIALS); MATHEMATICAL MODELS; MORPHOLOGY; PERTURBATION TECHNIQUES; STABILITY; STIFFNESS; SUBSTRATES;

EPITAXIAL FILMS; INTERFACIAL EVOLUTION EQUATION; MISFITTING STRAIN MODEL; STIFFNESS RATIO;

ULTRATHIN FILMS;

EID: 0942268461     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/37/2/012     Document Type: Article

References (13)

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