Two-step in situ annealing effects on sputter-deposited MgB2 thin films

Superconductor Science and Technology

Volumn 17, Issue 1, 2004, Pages 47-50

  Mori, Zon ^a   Doi, Toshiya ^b   Eitoku, Koji ^b   Ishizaki, Yuichiro ^b   Kitaguchi, Hitoshi ^c   Okada, Michiya ^d   Saitoh, Kazuo ^d   Hakuraku, Yoshinori ^b  

^a KUMAMOTO NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^b KAGOSHIMA UNIVERSITY   (Japan)

^c NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^d HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTALLIZATION; MAGNETRON SPUTTERING; SPUTTER DEPOSITION; SUBSTRATES; SUPERCONDUCTIVITY; TEMPERATURE;

ANNEALING EFFECTS; SUPERCONDUCTING PROPERTIES;

SUPERCONDUCTING FILMS;

EID: 0942268436     PISSN: 09532048     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-2048/17/1/008     Document Type: Article

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