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Volumn , Issue , 2003, Pages 211-214
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Self-Aligned Top and Bottom Metal Double Gate Low Temperature Poly-Si TFT Fabricated at 550°C on Non-Alkali Glass Substrate by Using DPSS CW Laser Lateral Crystallization Method
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Author keywords
[No Author keywords available]
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Indexed keywords
CARRIER MOBILITY;
CONTINUOUS WAVE LASERS;
CRYSTALLIZATION;
EXCIMER LASERS;
GRAIN BOUNDARIES;
MOSFET DEVICES;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
POLYSILICON;
PUMPING (LASER);
SCANNING ELECTRON MICROSCOPY;
GLASS SUBSTRATES;
LATERAL CRYSTALLIZATION METHOD;
THIN FILM TRANSISTORS;
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EID: 0842309821
PISSN: 01631918
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (21)
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References (7)
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